|
Main
current research activities include in-situ chemical
sensing in tungsten nitride Atomic Layer Deposition processes for process
optimization, development of a spatially programmable showerhead for Chemical
Vapor Deposition, fabrication of integrated micro-system
devices (MEMS piezoelectric microphone, micro-machined cantilever
libraries...), determination of piezoelectric properties of PZT thin films.
|
|
To support these activities, LAMP houses a wide variety of equipment
for wet and dry semiconductor processes as well as analytical tools. It includes
a 6 inch production-scale ULVAC CVD cluster tool, 2 UHV
systems for Atomic Layer Deposition and advanced CVD (multi-showerhead)
processing, a 6 inch LAM high density
plasma etch cluster tool, a MAS 400 mask aligner for high
resolution contact lithography, an e-beam metallization chamber, sol-gel and photoresist spinners, annealation and oxydation furnaces, several optical
microscopes as well as a variety of chemical gas sensors (RGAs, FTIR,
acoustic sensors) for in-situ process diagnostics.
|
Laboratory for
Advanced Materials Processing
