Laboratory for Advanced Materials Processing

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Semiconductor Equipment 

 

To use equipment in the LAMP facility, you must receive training and qualification from  the tool supervisor. Students who run tools without consulting the supervisor will have their access to the cleanroom canceled.

 

Tool, model Supervisor SOP or manual
UHV Atomic Layer Deposition system L. Henn-Lecordier  
UHV programmable multi-segment CVD reactor L. Henn-Lecordier  
Tube furnace Atomic Layer Deposition reactor Erin Robertson  
Annealing furnace, 1000C, Lindberg L. Henn-Lecordier  
Sopra GES5 spectroscopic ellipsometer, UV-range, automated mapping and variable angle, microspots L. Henn-Lecordier  
4 point probe station for sheet resistance measurements L. Henn-Lecordier SOP
HP 4145B Semiconductor paramater analyzer L. Henn-Lecordier  
Agilent E4980A 20Hz-2MHz Precision LCR meter L. Henn-Lecordier  
Residual gas analyzer, Vision 1000C, MKS, 300 amu CIS L. Henn-Lecordier  
Residual gas analyzer, Inficon 300 amu CIS Erin Robertson  
Residual gas analyzer, Inficon 200 amu CIS L. Henn-Lecordier  
Gas phase acoustic sensor, Inficon Composer L. Henn-Lecordier  
FTIR compact spectrometer, Inficon L. Henn-Lecordier  
8" sol-gel spincoater, SP 100 Bidtec controller    
8" photoresist spincoater, SP 100 Bidtec controller    
Programmable hot plate, 400C; for sol-gel and photoresist    
Programmable furnace, Vulcan 3-550, NEY L. Henn-Lecordier  
Oven, Blue M, Electric Gal. Signal L. Henn-Lecordier  
Oven, Lindberg, Electric Gal. Signal L. Henn-Lecordier  
Sartorius A210P  microbalance, 1/10000g L. Henn-Lecordier  
Microscope, Ferroscope L. Henn-Lecordier  
Microscope, Optiphot POL, Nikon L. Henn-Lecordier  

Last updated by L. Henn-Lecordier, February 200
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